The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 1998

Filed:

Jan. 16, 1997
Applicant:
Inventors:

Yoshiaki Yamada, Tokyo, JP;

Toshiki Shinmura, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429811 ; 20429807 ; 20429809 ; 20429813 ; 20429815 ; 20419212 ; 20429819 ;
Abstract

A magnetron sputtering electrode 2 is attached to a vacuum chamber 1 to make it retain a Ti target 4 via a back plate 3. A substrate 9 is loaded on a substrate holder 8 provided at a lower portion of the vacuum chamber 1. A collimation plate 6 is provided between the substrate 9 and the Ti target 4 to pass through only the sputtered particles advancing in the vertical direction, and, at its outside, shield plates 5, 7 are provided. The shield plate 5 at the target side is shaped in a wave form and thus its surface area is increased so that nitrogen can be adsorbed as much as possible.


Find Patent Forward Citations

Quick Actions:

Yamada, Yoshiaki. (1998). Sputtering apparatus (U.S. Patent No. 5744016). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5744016

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…