The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 1998
Filed:
May. 02, 1996
Applicant:
Inventors:
Ting-Chiang Hsieh, Hsinchu Hsien, TW;
Dong-Yuan Goang, Taoyuan Hsien, TW;
Ren-Long Chu, Hsinchu Hsien, TW;
Assignee:
Industrial Technology Research Institute, Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D / ;
U.S. Cl.
CPC ...
156 99 ; 156102 ; 264-134 ; 264-21 ; 264216 ; 4271631 ;
Abstract
A method of fabricating an optical retardation film having single axis crystal. A polymer material such as polyvinyl alcohol, polystyrene, polycarbonate, or poly methylmethacrylate dissolved in an alkyl solvent forms a polymer solution. A coating of the solution is deposited on a glass substrate by means of a spin coater. The coated substrate is heated in an oven or a heating pad to dry the polymer film. The dried film separated from the glass substrate forms the optical retardation film.