The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 1998
Filed:
Oct. 16, 1995
Takaaki Kobayashi, Tokyo, JP;
NEC Corporation, , JP;
Abstract
A wafer surface treating apparatus has an overflow treating tank for holding therein a chemical in which a wafer is to be soaked to perform a surface treatment of the wafer, piping for circulating the chemical overflowing from said treating tank to said treating tank, a filter unit for filtering the chemical passing through said piping to remove foreign articles from the chemical, and at least two temperature regulating mechanisms. The first temperature regulating mechanism keeps a temperature of the chemical in said treating tank at a predetermined temperature. The second temperature regulating mechanism regulates the temperature of the chemical in said filter unit to a temperature at which no deposit is produced from the chemical in said filter.