The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 1998

Filed:

Feb. 07, 1996
Applicant:
Inventors:
Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430313 ; 430318 ; 427 58 ; 427123 ;
Abstract

A method of forming copper patterns on a selection plate for a display, the selection plate having a plurality of holes. The method provides copper patterns that form selected tracks on the selection plate and that are disposed internally of selected holes, the copper patterns being sealed with a corrosion-resistant layer of nickel-phosphorous. The method includes steps of forming a copper layer on at least one surface of the selection plate, forming a layer of nickel-boron on the copper layer, using cataphoretic lithographic processing to form the desired patterns, and providing a nickel-phosphorous layer to seal the patterns.


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Van Der Sluis-Van Der Voort, Elisabeth. (1998). Method of photolithographically producing a copper pattern on a plate of (U.S. Patent No. 5738977). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5738977

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