The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 1998
Filed:
Jun. 02, 1995
Atsushi Nakamura, Hachiouji, JP;
Masaaki Futamoto, Tsukui-gun, JP;
Yoshiyuki Hirayama, Kodaira, JP;
Mikio Suzuki, Odawara, JP;
Yukio Honda, Fuchu, JP;
Takanobu Takayama, Hannou, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A film 12 with perpendicular magnetic anisotropy and a protective film 13 are formed over a single-crystal substrate 11. This substrate is made of either a single crystal having a hexagonal crystal structure and a plane (0001) in parallel with the substrate plane or a single crystal having a cubic crystal structure and a plane (111) in parallel with the substrate plane, and the film is epitaxially grown such that its easy axis of magnetization is perpendicular to the substrate plane. As a result, the film can have its perpendicular orientation and perpendicular magnetic anisotropy improved to effect a perpendicular magnetic recording of high density thereby to provide the perpendicular magnetic recording media, of which the film has a remarkably enhanced orientation.