The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 1998
Filed:
Sep. 20, 1995
Alcatel N.V., Rijswijk, NL;
Abstract
To determine the degree of correspondence between a first and a second pattern, the first and the second pattern are mapped to n first (V11 to V1n) and m second (V21 to V2m) feature vectors respectively. For points ({1, 1} to {n, m}) in a subarea of a matrix formed by the n first (V11 to V1n) and m second (V21 to V2m) feature vectors, the distance of the respective first (V11 to V1n) and the second (V21 to V2m) feature vectors is computed, and from the mean distance along an optimum path by means of a DP algorithm. Data regarding the gradient of the respective optimum path are determined during the computation for boundary points of the subarea, and the subarea is dynamically reduced for further computations on the basis of these data. The mean distance is used as the degree of correspondence.