The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 1998
Filed:
Dec. 04, 1996
Kazumi Haga, Komae, JP;
Motoshi Sakai, Komae, JP;
New Creation Co., Ltd., Tokyo, JP;
Abstract
The method comprises the steps of: irradiating an objective region to be measured with an illuminating light in an oblique direction thereto; forming an image of reflected light from the objective region by member of an object-side telecentric optical system or an image-object-side telecentric optical system, which has an optical axis coinciding with an incident direction of the illuminating light to the objective region and has a object-side angular aperture against a point on the objective region, which is set at a predetermined angle; picking up the formed image to collect luminance data of respective points in the objective region; and processing the luminance data to recognize bright and dark portions and thereby determining the presence or absence of an irregular portion and a shape of the irregular portion, in the objective region. The method enables measurement of the presence or absence of irregularity and the shape of the irregularity in a wide surface region with a high accuracy and in a single operation by using an apparatus having relatively simple construction.