The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 1998
Filed:
Apr. 17, 1996
Young-Wi Ko, Seoul, KR;
Yun-Jin Cho, Seoul, KR;
Sung-Hee Cho, Kyungki-do, KR;
Hyong-Gon Lee, Kyungki-do, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A polysilicon gate electrode of an integrated circuit field effect transistor is formed in two portions which are isolated from one another. The first portion is formed on the gate insulating region. The second portion is formed on the semiconductor substrate outside the gate insulating region and is electrically insulated from the first portion. Since the first and second portions of the polysilicon gate electrode are isolated from one another, only the charge which is on the first polysilicon portion contributes to gate insulating region degradation during plasma etching. After polysilicon gate electrode formation, the first and second portions may be electrically connected by a link. Field effect transistor performance and/or reliability are thereby increased.