The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 1998

Filed:

Feb. 15, 1995
Applicant:
Inventors:

Mark Thomas DeMeuse, Robbinsville, NJ (US);

Diana Marie Applegate, Toms River, NJ (US);

Kwan-Yue Alex Jen, Old Bridge, NJ (US);

John Thomas Kenney, Palo Alto, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ; C08G / ; B32B / ;
U.S. Cl.
CPC ...
523137 ; 252582 ; 359237 ; 359242 ; 359244 ; 359245 ; 385122 ; 4284735 ; 526259 ; 526265 ; 528125 ; 528126 ; 528128 ; 528172 ; 528176 ; 528220 ; 528229 ; 528353 ;
Abstract

A process for intramolecularly condensing a polyamic acid composition containing an NLO compound to form a polyimide host matrix composition containing as a guest the NLO compound, which process includes the step of uniformly heating the polyamic acid composition, in the absence of a solvent or diluent, to a temperature at which the intramolecular condensation will occur without thermal degradation of the NLO compound, so that the temperature differential within the polyamic acid is below that which will produce localized thermal degradation temperatures, until the intramolecular condensation of the polyamic acid composition to the polyimide host matrix composition is substantially complete. Polyimide host matrix compositions containing guest NLO compounds prepared by the inventive process are also disclosed, wherein the NLO compounds have external field-induced molecular alignments.


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