The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 1998
Filed:
Jan. 11, 1996
Applicant:
Inventor:
Gary Hillman, Livingston, NJ (US);
Assignee:
S.sup.3 Service Support Specialties, Inc., Montville, NJ (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134-3 ; 134-13 ; 134-2 ; 134 31 ;
Abstract
A silicon substrate cleaning method and apparatus is presented in which a hydrous cleaning solution is caused to evaporate at a temperature at about or above its azeotropic temperature and a cleaning vapor thus produced is applied to a substrate to remove unwanted oxide. This method can be applied to a series of silicon substrates with consistent results, substrate to substrate, despite the azeotropic temperature characteristics of the hydrous cleaning solution. The method produces an oxide-free substrate without contaminants, particulates or residue.