The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 1998

Filed:

Oct. 02, 1995
Applicant:
Inventors:

Rex A Becker, Janesville, WI (US);

Alfred C Li, Naperville, IL (US);

James R Burns, Springfield, PA (US);

Assignee:

Beloit Technologies, Inc., Wilmington, DE (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05C / ;
U.S. Cl.
CPC ...
118411 ; 118419 ;
Abstract

An applicator head is positioned beneath a backing roll and has a housing divided into three sections. A first coating pond is defined between an overflow barrier and a first wall. A converging plate extends between the first wall and a second wall, and converges toward the substrate, and a second pond is defined between the plate and an end wall. Coating is introduced to both ponds. A low pressure cavity is defined beneath the converging plate and between the first wall and the second wall. The cavity opens to the second pond, and draws air and excess coating from the second pond. The substrate is prewetted as it passes through the first pond, and coating deprived of entrained air is applied to the substrate in the second pond. Coat weight uniformity and increased machine speeds are thus achievable.


Find Patent Forward Citations

Becker, Rex. (1998). Dual chamber film applicator with in-pond overflow (U.S. Patent No. 5735957). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5735957

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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