The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 1998

Filed:

Nov. 26, 1996
Applicant:
Inventor:

Colin A Sanford, Windham, NH (US);

Assignee:

Amray, Inc., Bedford, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
250310 ; 25044211 ;
Abstract

A charged particle beam apparatus has a carrier for supporting a sample. A tilt mechanism is provided for tilting the wafer carrier through a range of attitudes including an attitude wherein a normal to the carrier defines a predetermined first angle on one side of vertical. A charged particle beam column irradiates a sample on the carrier with a beam of charged particles. The column is canted at a second angle on the opposite side of vertical from the stage normal such that the angle of beam incidence on the sample relative to the stage normal is equal to the sum of the first and second angles. The carrier may be tilted an attitude at the other end of the range of attitudes which is such that the carrier normal is parallel to the column axis and the beam is thus normal to the sample. The first and second angles in limit preferably equal thirty degrees, and the maximum angle of beam incidence on the sample thus equals sixty degrees.


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