The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 1998
Filed:
Jul. 22, 1996
Fumikazu Kobayashi, Shizuoka, JP;
Fuji Photo Film Co., Ltd., , US;
Abstract
The present invention provides a negative-working image recording material which can be used as a lithographic printing plate for so-called direct plate making process comprising directly making plate from digital signal such as computer signal. A novel negative-working image recording material is provided, comprising a high-molecular compound having a weight-average molecular weight of from 5,000 to 400,000 and a repeating unit represented by the following general formula (I), and a substance which absorbs light to generate heat: ##STR1## wherein R.sup.1 represents a hydrogen atom, a halogen atom, a cyano group (--CN) or an alkyl group; R.sup.2 represents an alkyl group, an aralkyl group or an aromatic ring group; L.sup.1 represents a single bond or a phenylene group; L.sup.2 represents an alkylene group, an alkenylene group or an aromatic ring group; X represents a single bond, --O--, --OCO--, --COO--, --CONR.sup.3 --, --CONR.sup.3 CO--, --CONR.sup.3 SO.sub.2 --, --NR.sup.3 --, --NR.sup.3 CO--, --NR.sup.3 SO.sub.2 --, --SO.sub.3 --, --SO.sub.2 NR.sup.3 -- or --SO.sub.2 NR.sup.3 CO--; and R.sup.3 represents a hydrogen atom, an alkyl group, an aralkyl group or an aromatic ring group. The negative-working image recording material according to the present invention can provide a lithographic printing plate which can be exposed to infrared laser to undergo heat mode writing and exhibits a high sensitivity and developability when developed with an aqueous developer.