The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 1998
Filed:
Mar. 09, 1995
Satiko Okazaki, Tokyo, JP;
Masuhiro Kogoma, Saitama, JP;
Research Development Corporation of Japan, Tokyo, JP;
Abstract
A plasma reaction method is conducted at atmospheric pressure and is used to treat a surface of a substrate with a reactive plasma. The reaction method involves introducing a mixture of helium and a reactant (monomer) gas into a reaction vessel having upper and lower electrodes. In a preferred embodiment the upper electrode is provided with grooves for diffusing the plasma uniformly over the surface of the electrode. The helium and reactant gas mixture is excited at atmospheric pressure to produce a stable glow discharge plasma which reacts with the surface of the substrate. The preferred gas mixture has helium present at greater than 90% and uses ethylene or tetrafluoromethane as a reactant component.