The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 1998
Filed:
Feb. 25, 1997
Applicant:
Inventors:
Assignee:
Samsung Display Devices Co., Ltd., Kyungki-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
445 47 ; 313402 ;
Abstract
A method for manufacturing a shadow mask including an electron reflection layer on the surface of the shadow mask on which electrons impact. The electron refection layer is formed by spray coating a composition including an inorganic binder and a bismuth ammonium citrate solution containing 10-50 wt % of bismuth, and heat treating the coated shadow mask. The method is simple in application and greatly reduces hole-blocking and thermal deformation of the shadow mask, improving color purity of a reproduced image and enhancing the quality of the image.