The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 1998
Filed:
Jan. 17, 1997
Applicant:
Inventors:
Yasuhisa Yamada, Tokyo, JP;
Hirosi Nozue, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504922 ; 25049222 ; 250398 ; 430-5 ;
Abstract
In a beam exposure system, a beam is irradiated onto a mask unit, and the beam passed through the mask unit is deflected and is irradiated onto a target. The mask unit includes a polygonal hollowed holder and a plurality of masks. The holder is formed by mask mounting plates each having apertures for mounting the masks, and frames each having an aperture for passing the beam therethough.
Yamada, Yasuhisa. (1998). Beam exposure system having improved mask unit (U.S. Patent No. 5731591). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5731591
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile