The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 1998
Filed:
Dec. 26, 1996
Applicant:
Inventors:
Dong-Heui Jang, Suwon, KR;
Dong-Hyun Kim, Suwon, KR;
Choung-Hee Kim, Suwon, KR;
Se-Yeon Jang, Suwon, KR;
Assignee:
Samsung Electronics Co. Ltd., Suwon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A46B / ;
U.S. Cl.
CPC ...
15 881 ; 15 77 ;
Abstract
A semiconductor wafer cleaning apparatus having an edge rinse member adapted for rinsing edges of a semiconductor wafer and having a moving member adapted to permit horizontally movement of the edge rinse member, wherein the apparatus is adapted to minimize or prevent an upper surface of the wafer from being stained with pollutants during rinsing. The wafer cleaning apparatus minimizes or prevents rebounding of a rinse solution containing particles from the inside wall of a bowl during rinsing of the edges of a semiconductor wafer.