The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 1998

Filed:

Jun. 17, 1996
Applicant:
Inventor:

Arthur T Leung, Sunnyvale, CA (US);

Assignee:

Sun Microsystems, Inc., Palo Alto, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F / ;
U.S. Cl.
CPC ...
395591 ; 395565 ;
Abstract

An improved method and apparatus for ordering traps in a multiscalar design to avoid pipeline delays. Execution units which generate their traps earlier in the pipeline are used to build a number of possible enable masks, for indicating which instructions should complete, using the ordering information available from the different execution units. The enable masks cover the different possibilities of trap or no trap for the execution units which produce later traps. The traps from the execution units providing a later trap indication then select from the possible enable masks depending upon whether or not a trap is indicated by such second group of execution units. The enable mask is then used to enable or disable the destination registers used by the different execution units for that group of instructions.


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