The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 1998
Filed:
May. 11, 1995
Sergei V Fogel, Rochester, NY (US);
Roy Y Taylor, Scottsville, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method and apparatus for printing lenticular pictures includes imposing lines of information in the form of segmented images of a scene onto a light sensitive material. Alternate segments or lines are provided from different perspective views of the same scene to be printed. The light sensitive material has a transparent lenticular material attached thereto. The light sensitive material is exposed, from the side opposite the lenticular material, by light from an illuminated image. The exposure may be effected by optical projection or by contact printing or by CRT image projection or other device. A reference grid, having a pitch slightly different from the pitch of the lenticular material, is positioned on the lenticular material and is effective to cause a Moire pattern to become visible when the lenticular material is moved relative to the light sensitive material. The Moire pattern is used to adjust the position of the lenticular material or the negative, prior to exposure of the light sensitive material. After exposure, a reflective material is applied to the side of the light sensitive material opposite the side to which the lenticular material is attached, to provide a three dimensional print. In another example, several reference grids are used for additional accuracy of alignment.