The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 1998

Filed:

Mar. 22, 1996
Applicant:
Inventors:

Klaus Bittins, Frankenthal, DE;

Marc Heider, Neustadt, DE;

Martin Schmidt-Radde, Beindersheim, DE;

Jochen Kellenbenz, Bad Durkheim, DE;

Kurt Josef Wagner, Romerberg, DE;

Peter Zehner, Ludwigshafen, DE;

Stefan Berg, Frankenthal, DE;

Assignee:

BASF Aktiengesellschaft, Ludwigshafen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D / ; C07C / ; C07C / ; C07C / ; C07C / ; C07C / ;
U.S. Cl.
CPC ...
5483351 ; 422117 ; 422227 ; 528126 ; 528212 ; 528214 ; 528215 ; 568672 ; 568679 ; 568680 ; 568822 ; 568831 ; 568835 ; 568852 ; 585951 ;
Abstract

Process for carrying out gas/liquid reactions at from (-50.degree.) to 300.degree. C. and from 0.1 to 100 bar by carrying out the reaction in the absence of a continuous gas phase, and, as a special case, a process for the batchwise reaction of acetylene in the liquid phase at from 0.degree. to 300.degree. C. and from 2 to 30 bar, in which acetylene is introduced a) in the absence of a continuous gas phase and b) under isobaric conditions to a degree of saturation of from 5 to 100%.


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