The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1998
Filed:
Jun. 11, 1997
Minoru Hojo, Kyoto, JP;
Hiroo Kobayashi, Kyoto, JP;
Akira Inoue, Kyoto, JP;
Syunichi Igeta, Kyoto, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure system including a master mask used for exposing a glass panel to form a plurality of phosphor stripes or dots on an inner surface of the glass panel wherein the master mask and/or a light source are movable for correction of an exposure position, thereby eliminating the need to attach and remove a color selecting mechanism to and from the glass panel when the glass panel is exposed to form a fluorescent screen on the inner surface of the glass panel.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile