The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1998
Filed:
Mar. 07, 1996
Applicant:
Inventor:
Shuji Takeshita, Kawasaki, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430322 ; 430324 ;
Abstract
An exposure mask includes a transparent region and an opaque region defined on a transparent substrate, with a transition region formed between he transparent region and the opaque region by a plurality of opaque patterns disposed with respective sizes and respective mutual separations changed gradually and continuously from the opaque region toward the transparent region, such that exposure dose increases gradually and consecutively from the opaque region toward the transparent region.
Quick Actions:
Takeshita, Shuji. (1998). Mask with gradual increase in transmittance from opaque to transparent (U.S. Patent No. 5725972). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5725972
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile