The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1998
Filed:
Feb. 16, 1996
Takuya Yamasaki, Kochi, JP;
Keizo Ohta, Okayama, JP;
Ohta Inc. (Ohta Kabushiki Kaisha), Okayama, JP;
Abstract
According to the present invention, there is provided a walking assistance crutch which is comfortable to use, and which can keep a user from falling on his face by its existence even if he falls down by accident. Features in structure of the crutch according to the invention are as follows. More specifically, the crutch comprises a crutch main body including an armpit rest at its upper end, a foot portion at its lower end, and a handle grip at its intermediate portion. A vertical length or width W of the armpit rest is increased, and a portion of the armpit rest to be held beneath a shoulder of a user is formed to have a substantially triangular cross section so that it has curved surfaces which conform with contours of an inner side of an upper arm and a breast side wall of the user. Also, the armpit rest is formed to have the curved surfaces which extend substantially in conformity with the contours of the inner side of the upper arm and the breast side wall of the user, and front and rear portions of the armpit rest are formed larger than the portion to be held beneath the shoulder of the user. The handle grip is extended forwardly from a phantom line extending between the armpit rest and the foot portion.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile