The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1998
Filed:
Jun. 06, 1995
Applicant:
Inventors:
Patrick M Handke, Monroeville, PA (US);
John R Starr, Leechburg, PA (US);
Doris Wong, Trafford, PA (US);
Assignee:
Respironics Inc., Pittsburgh, PA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61M / ;
U.S. Cl.
CPC ...
12820713 ; 12820718 ; 12820525 ; 12820626 ;
Abstract
A miniature nasal mask for supplying breathing gas to a human user through an interface with the user's nares, the interface being maintained by a contact seal which engages the user's face only within an area between the tip and immediately adjacent lateral flanks of the user's nose adjacent to the nares, and the user's upper lip.
Published as:
CA2177524A1; EP0747078A2; AU5459896A; JPH0910311A; EP0747078A3; US5724965A; AU695692B2; JP2926317B2; EP0747078B1; DE69624405D1; CA2177524C; DE69624405T2;
Quick Actions:
Handke, Patrick. (1998). Nasal mask (U.S. Patent No. 5724965). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5724965
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile