The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 1998
Filed:
Jun. 27, 1995
Fujitsu Limited, Kawasaki, JP;
Abstract
An exposure method which has a step of offsetting a first scanning line bend by scanning means with a second scanning line bend by an image forming lens, and/or a step of correcting angles of optical axis of a plurality of light beams in accordance with the amount of a deviation in a subscanning direction due to a difference of the angles of incidence, so that a distance between scanning lines on a photosensitive body due to the plurality of light beams is corrected. An image forming apparatus which has an image forming lens for producing a second scanning line bend is so as to offset a first scanning line bend by scanning means, and/or correcting means for correcting angles of optical axis of a plurality of light beams in accordance with the amount of a deviation in a subscanning direction due to a difference of the angles of incidence, so that a distance between scanning lines on a photosensitive body due to the plurality of light beams is corrected.