The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 1998

Filed:

Mar. 08, 1996
Applicant:
Inventors:

James A Bonham, Grant Township, Washington County, MN (US);

Mitchell A Rossman, Minneapolis, MN (US);

Richard J Grant, Maplewood, MN (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08L / ; C08F / ; G03C / ; G03F / ;
U.S. Cl.
CPC ...
522 63 ; 522 67 ; 522904 ; 522151 ; 522152 ; 522166 ; 522167 ; 522 74 ; 522 79 ; 522 80 ; 522 84 ; 522 78 ; 522148 ; 522160 ; 522 88 ; 522 87 ; 522162 ; 522150 ; 522 90 ; 522 96 ; 522121 ; 522114 ; 522135 ; 522142 ; 4302811 ; 4302861 ; 4302871 ;
Abstract

Radiation-sensitive organo-halogen compounds that have a photo-labile halomethyl-1,3,5-triazine moiety and a polymeric moiety within the same molecule. The compounds of this invention are comprised of a polymeric moiety having attached or incorporated within its structure at least one 1,3,5-triazine nucleus, said triazine nucleus having at least one halomethyl substituent attached to a carbon atom of the triazine nucleus. These compounds are capable of being stimulated by actinic radiation at wavelengths of from about 250 to about 900 nanometers to generate free radicals and/or acids. The compounds of this invention are useful as photoinitiators in free radical polymerization reactions, oxidation-reduction reactions, or reactions sensitive to acid, and they also exhibit the capability to crosslink upon exposure to light.


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