Pattern transfer techniques for fabrication of lenslet arrays using

Abstract

In a method for forming lenslets which collect light and focus it onto photosensitive elements of an electronic imager includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate, (a) providing a transparent polyester lenslet-forming layer on a substrate or on layer(s) on the substrate, the polyester containing repeat units, in part, having the structure ##STR1## wherein: n is 2 or greater; x is selected from the group consisting of H, CH.sub.3, Br and Cl; and Z is selected from the group consisting of nil, O, S, CH.sub.2, C.dbd.O, SO, SO.sub.2, CH--CH.sub.3, CH.sub.3 --C--CH.sub.3, CF.sub.3 --C--CF.sub.3, CH.sub.3 --C--CH.sub.2 CH.sub.3, ##STR2## (b) forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning the etch-stop layer to form a mask so that the pattern corresponds to lenslets to be formed; (c) anisotropically plasma etching the transparent lenslet-forming layer according to the pattern; (d) removing the thin etch-stop mask; and (e) thermally reflowing the patterned transparent layer to form the transparent lenslets.