The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 1998
Filed:
Sep. 01, 1995
David Conrad Tannenbaum, Hurley, NY (US);
Andrew David Bowen, Saugerties, NY (US);
Jeffrey Scott Spencer, Hurley, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A system and method for drawing non-opaque objects with realistic refraction attributes. The system adjusts the pixel values of an object with a refraction index other than unity so that the resulting image approximates a refracted image. Adjacent pixel values are copied and blended with the pixel being rendered based upon a calculated refraction value. Refraction can be approximated as a surface effect by offset vectors, as a property of an object having parallel front and back surfaces and as an arbitrary object with non-parallel opposing surfaces. The more complex representations provide improved approximations of the refracted image. The resulting image presents a more realistic view of the refracted image.