The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 1998

Filed:

Oct. 05, 1995
Applicant:
Inventors:

Yoshiaki Echigo, Kyoto, JP;

Shoji Okamoto, Kyoto, JP;

Hiroshi Yamada, Kyoto, JP;

Isao Tomioka, Kyoto, JP;

Yoshiaki Iwaya, Kyoto, JP;

Assignee:

Unitika Ltd., Hyogo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ; C08K / ;
U.S. Cl.
CPC ...
528182 ; 528183 ; 528188 ; 528351 ; 528353 ;
Abstract

This invention provides a poly(amic acid) solution which does not contain aprotic polar solvents such as DMF, NMP, DMAc, DMSO, as well as a polyimide film obtained therefrom having appropriate flexibility and a small coefficient of linear thermal expansion and a coated material in which the polyimide film is formed on a substrate. More particularly, it provides a poly(amic acid) solution which has an aromatic poly(amic acid) and a tertiary amine as the solute and a water soluble alcohol compound and/or a water soluble ether compound as the solvent and contains substantially no aprotic polar solvent, as well as a polyimide film obtained from the poly(amic acid) solution and a coated material obtained by forming the film on a substrate.


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