The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 1998
Filed:
Jun. 27, 1995
Hoon Huh, Seoul, KR;
LG Semicon Co., Ltd., Cheongju, KR;
Abstract
A mask and method of manufacturing is disclosed. The mask may include a transparent quartz substrate having light-transmitting regions and light-shielding regions, a light-control layer formed on the substrate excluding a portion corresponding to a light-transmitting region of an edge portion, and a light-shielding layer formed on the light-control layer of an light-shielding region. The method may include the steps of preparing a quartz substrate, forming a light-control layer on the quartz substrate, forming a light-shielding layer on the light-shielding region of the light-control layer, and selectively etching the light-control layer corresponding to light-transmitting regions of an edge portion of the substrate.