The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 1998
Filed:
Feb. 15, 1996
Applicant:
Inventors:
Charles George Hlinka, Lebanon, NJ (US);
Janet Louise Markham, Middlesex, NJ (US);
Casimir Roman Nijander, Lawrenceville, NJ (US);
Keith Owen Mersereau, Northampton Township, PA (US);
Yiu-Huen Wong, Summit, NJ (US);
Assignee:
Lucent Technologies Inc., Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C / ; G02B / ;
U.S. Cl.
CPC ...
216 26 ; 216 58 ; 216 83 ; 430321 ;
Abstract
A method for making a microlens comprising the steps of uniformly distributing a volume of Poly(methylmethacrylate) (PMMA) across a major surface of a substrate, hardening the PMMA layer on the substrate surface, patterning the PMMA layer and forming patterned PMMA and reflowing the patterned PMMA to form at least one microlens on the substrate.