The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 1998
Filed:
Oct. 04, 1996
Applicant:
Inventor:
Yifan Tang, St. Louis, MO (US);
Assignee:
Emerson Electric Co., St. Louis, MO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H02K / ; H02K / ; H02K / ; H02K / ;
U.S. Cl.
CPC ...
310168 ; 310186 ;
Abstract
An improved reluctance machine is provided wherein auxiliary flux paths are provided such that the leakage flux of the machine is directed through the auxiliary flux paths and not through the excited stator poles to reduce the impact of stator pole saturation on the machine's performance.