The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 1998
Filed:
Dec. 28, 1994
Applicant:
Inventors:
Hans Juergen Coufal, San Jose, CA (US);
Robert Keith Grygier, San Jose, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
2504922 ; 430302 ;
Abstract
A lithographic system for patterned exposure of radiation-sensitive resist comprises a radiation source, a mask, a converging optical element having a focal plane, and a phase-shifting optical element disposed at the focal plane of the converging optical element. The lithographic system produces enhanced images.
Coufal, Hans. (1998). Focal plane phase-shifting lithography (U.S. Patent No. 5717218). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5717218
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile