The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 1998

Filed:

Oct. 11, 1996
Applicant:
Inventors:

Hiroyuki Watanabe, Hamamatsu, JP;

Hideyuki Suzuki, Hamamatsu, JP;

Masahiko Iguchi, Hamamatsu, JP;

Assignee:

Hamamatsu Photonics K.K., Shizuoka-Ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
250310 ; 250397 ;
Abstract

In the scanning electron microscope 10, the electron beam B is emitted to the specimen 2. When the electron beam B strikes the specimen 2, the specimen 2 reflects the electron beam as reflected primary electrons and generates secondary electrons. Those electrons are detected by the electron detector 14, which in turn produces a reflection image of the specimen 2. The electron multiplier 1 is used for this scanning electron microscope 10. The electron multiplier 1 includes the electron reflection plate 7 which receives the electron beam B when the electron beam B passes by or passes through the specimen 2. Upon receipt of the electron beam B, the electron reflection plate 7 reflects the electron beam B as reflected primary electrons and generates secondary electrons. The microchannel plate 3 is formed with a multiplicity of channels 31 for multiplying the reflected primary electrons and the secondary electrons.


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