The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 1998
Filed:
Jun. 07, 1996
Cesar M Garza, Plano, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A mask for use in semiconductor fabrication which includes a light transparent substrate, preferably glass, having a border and light semitransparent material having light transmissivity preferably in the range of from about 6 to about 10 percent disposed thereon within the border. A light opaque layer which is sensitive to light and which can be patterned and have a predetermined portion thereof removed in response to selective exposure to light is disposed along substantially the entire border of the substrate. The mask can further include a region of light semitransparent material disposed around the border and under the light opaque layer. The light opaque layer is preferably a photosensitive polyimide.