The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 1998
Filed:
Oct. 12, 1995
Applicant:
Inventor:
Junichiro Iba, Wappingers Falls, NY (US);
Assignee:
Kabushiki Kaisha Toshiba, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21V / ; G03B / ; G03B / ;
U.S. Cl.
CPC ...
355 67 ; 355 53 ; 355 71 ; 362296 ;
Abstract
In a photolithography system, an illumination assembly to provide intensified uniform illumination includes an illumination source reflector and a plate having an aperture opening therethrough and a mirrored surface thereon, the mirrored surface of the plate confronting the illumination source reflector. The illumination assembly further includes an illumination source for generating illumination disposed between the illumination source reflector and the plate.
Iba, Junichiro. (1998). Illumination aperture of low intensity loss (U.S. Patent No. 5715040). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5715040
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