The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 1998

Filed:

Feb. 23, 1995
Applicant:
Inventors:

Courtlandt B Lawrence, Kanata, CA;

M Aslam Lone, Deep River, CA;

John W Barnard, Manitoba, CA;

Dennis L Smyth, Deep River, CA;

Wlodzimierz Kaszuba, Gloucester, CA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R / ;
U.S. Cl.
CPC ...
324 713 ; 250396 ;
Abstract

An electron beam stop for use with high power electron beam accelerators can be used to measure beam parameters including energy, current, scan width, scan offset and scan uniformity. The beam stop is split in two segments in the direction of electron travel, with the first segment closest to the beam source absorbing a portion of the electrons incident thereon and the second segment farthest from the beam source absorbing all of the electrons that pass through the first segment. The ratio of charges deposited in the two segments is a sensitive index of the energy of the primary electrons, i.e., a measure of beam energy. The sum of the charges in the two segments is a direct measure of the number of electrons incident on the absorbing medium, i.e., a measure of the beam current.


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