The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 1998

Filed:

Mar. 25, 1996
Applicant:
Inventors:

Bruce P Neri, North Andover, MA (US);

John S Curtis, Fairlight, GB;

Mark L Collins, Holden, MA (US);

Danahey Ryan, Port Deposit, MD (US);

Assignee:

Amoco Corporation, Chicago, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12M / ; C12M / ;
U.S. Cl.
CPC ...
4352872 ; 4352876 ; 4352885 ; 4352887 ; 422 681 ; 422102 ;
Abstract

The present invention features a vessel for isolating a target in a sample. The vessel includes at least one reaction chamber, a wash system and an effluent system. The reaction chamber includes a closed cell adapted to receive a support, a sample potentially containing target and at least one first probe, and thereafter being closed. The probe is capable of associating with the support and the target to form a support-probe-target complex and sample debris upon imposition of probe binding conditions within the reaction chamber. A wash system is capable of introducing solutions into the reaction chamber for washing the support to solubilize and suspend sample debris. Upon imposition of wash conditions, solutions are allowed to enter the reaction chamber to solubilize such sample debris. An Effluent system is in communication with the reaction chamber and capable of receiving sample debris and wash solutions. The vessel receives the sample, binds the target, if present, to the support, allows wash solutions to remove sample debris, and removes wash solutions and sample debris through the effluent system, leaving target isolated on the support.


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