The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 1998
Filed:
Dec. 19, 1995
Helmut Franz, Pittsburgh, PA (US);
Peter T Dishart, Pittsburgh, PA (US);
Glenn E Freeman, Tarentum, PA (US);
Frank J Pazul, Lower Burrell, PA (US);
Robert T Shumaker, Jr, Manorville, PA (US);
James F Wilson, Worthington, PA (US);
PPG Industries, Inc., Pittsburgh, PA (US);
Abstract
The present invention provides a method of forming a desired pattern with a coating on a substrate. The method includes the steps of applying a water soluble resist material in a predetermined pattern to a surface of a substrate, drying the resist material, depositing a coating on the surface of the substrate to form a coated substrate, wherein a portion of the coating overlays the resist material, and dissolving the resist material on the coated substrate with water to remove the resist material and corresponding overlaying coating and form a desired coating pattern on the substrate surface. The dissolving step preferably includes the step of directing high temperature and high pressure water sprays at the surface of the coated substrate to wash off the resist and corresponding overlaying coating. The removal of the resist material may include a prewash operation wherein the surface of the substrate is wetted with water and coating is allowed to soak. The present invention also discloses a resist material for masking selected portions of a glass sheet to form a desired coating pattern. The resist material includes 1-20 wt. % water soluble polymer film former, 0 to 3 wt. % surfactant, 0 to 5 wt. % rinse aid and a solvent. The film former, surfactant and rinse aid are preferably all soluble in the solvent. In one particular embodiment of the invention, the film former is selected from a group consisting of polyvinylpyrrolidone, polyvinylalcohol, sodium alginate, hydroxyethyl cellulose and combinations thereof, the rinse agent is selected from a group consisting of sodium bicarbonate, sodium hydrogen phosphate, sodium sulfate, inorganic salts and combinations thereof, and the solvent is water, an organic solvent or a combination thereof.