The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 1998
Filed:
Sep. 12, 1994
Akihiro Suzuki, Kanagawa, JP;
Norio Shibata, Kanagawa, JP;
Shinsuke Takahashi, Kanagawa, JP;
Mikio Tomaru, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
An apparatus for high speed manufacturing of thin-film coated products, wherein the coating thickness is even and the products do not contain uneven streaks. The apparatus includes a coating head having a frontedge disposed on an upstream side of a support, a backedge disposed on a downstream side of the support, and a top end receding stepwise away from the frontedge and away from the support. The backedge has an acute-angled top end portion. The coating apparatus is configured so that filtration central-line waves (W.sub.CA) are formed in a direction perpendicular to the direction of movement of the support. These waves are formed in slit inner surfaces, a frontedge surface and a backedge surface of a top end portion of the coating head. Each wave in these surfaces is less than or equal to 0.2 .mu.m in length.