The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 1998
Filed:
Apr. 06, 1995
Applicant:
Inventors:
Robert R Alfano, Bronx, NY (US);
Feng Liu, Bronx, NY (US);
Quan-Zhen Wang, New York, NY (US);
Ping P Ho, Great Neck, NY (US);
Leming M Wang, Flushing, NY (US);
Xiangchun Liang, Bronx, NY (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ; G01N / ;
U.S. Cl.
CPC ...
2503581 ; 250330 ; 2503411 ;
Abstract
A system for imaging an object in or behind a highly scattering medium includes a light source for illuminating the highly scattering medium with a beam of light. The light emerging form the highly scattering medium consists of a ballistic component, snake-like component and a diffuse component. A 4F Fourier imaging system including a Fourier spatial filter located at 2F is used to form a time gated image of the emerging light, the time gated image consisting primarily of the ballistic component and the snake-like component.