The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 1998
Filed:
Jan. 19, 1996
Michael Schubert, Bremen, DE;
Jochen Franzen, Bremen, DE;
Bruker-Franzen Analytik GmbH, Bremen, DE;
Abstract
A method of mass selective loading of ion traps by ejection of undesirable ion species during the loading process by applying RF voltages with a mixture of frequency components to the trap electrodes. For several mass spectrometric investigations only ions with desired mass-to-charge ratios are to be loaded into the ion trap in order to achieve a more efficient utilization of the limited storage capability of the ion trap. The generation rate of the ions during the loading process in such a way that the equilibrium of the space charge inside the ion trap, balanced between ion generation rate and ion ejection rate, does not significantly deteriorate the mass resolution of the ejection process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile