The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 1998
Filed:
Jan. 22, 1996
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
The invention provides a spacer structure and a method of forming the spacer structure for providing uniform spacing between two transparent substrates of a Liquid Crystal Display. The spacer structure uses positive photoresist pads formed on opaque pads. The opaque pads are formed on one surface of one of the transparent substrates. The positive photoresist pads are formed using the opaque pads as a mask when exposing a layer of positive photoresist. The positive photoresist pads are self aligned to the opaque pads. The self alignment of the positive photoresist pads with the opaque pads make it possible to form several layers of positive photoresist pads on each opaque pad to achieve the desired spacer height.