The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 1998

Filed:

May. 22, 1995
Applicant:
Inventors:

Suhail Agwani, Kitchener, CA;

Stacy Royce Kamasz, Waterloo, CA;

Michael George Farrier, Boyne City, MI (US);

Assignee:

Dalsa, Inc., , CA;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
257221 ; 257219 ; 257240 ;
Abstract

In a charge coupled device having a plurality of output structures, the plurality of output structures including first and second output structures, a channel structure is defined in a channel region beneath a gate electrode and coupled to each of the plurality of output structures. The channel structure includes a plurality of area structures, each area structure being characterized by a uniform potential which is different from the potential characterizing each of the other area structures. The plurality of area structures are arranged within the channel region to define a first increasing stepped potential gradient from any point within the channel region to the first output structure and define a second increasing stepped potential gradient from any point within the channel region to the second output structure. A length of each area structure traversing the area structure in a first gradient direction is less than or equal to a first critical length, the first critical length being defined by a first desired transfer time for transferring charge to the first output structure. A length of each area structure traversing the area structure in a second gradient direction is less than or equal to a second critical length, the second critical length being defined by a second desired transfer time for transferring charge to the second output structure.


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