The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 1998
Filed:
Feb. 11, 1997
Applicant:
Inventors:
Ichiro Yamashita, Hiroshima, JP;
Ikuo Wakamoto, Hiroshima, JP;
Susumu Urano, Hiroshima, JP;
Yuichiro Kaminou, Aichi-ken, JP;
Assignee:
Mitsubishi Jukogyo Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2503 / ; 2503 / ;
Abstract
A deflection magnetic system and method are provided to deflect an electron beam through a predetermined angle while maintaining a circular cross-section for the electron beam. A plurality of spaced magnetic fields are provided to deflect the electron beam through angles less than the total predetermined angle, but the total angle is achieved when the beam passes through the last magnetic field. Magnetic shields are provided between the spaced magnetic fields to absorb any undesired leakage magnetic flux.