The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 1998
Filed:
Dec. 05, 1995
Raymond James Bunkofske, South Burlington, VT (US);
International Business Machine Corp., Armonk, NY (US);
Abstract
These desirable results and other objects of the present invention are realized and provided by depositing coating material on a front surface of a rotating wafer to spread a thin film over this surface while directing a light positive pressure of clean gas over the backside of the spinning wafer to preclude deposits of gas borne particles of the coating material thereon. Solvent application for removal of edge coating can be employed simultaneously with, or subsequent to, the deposit of coating material on the front surface In the apparatus, the wafer is mounted for rotation over the open end of a containment member terminating at its top in a ring surface to define a central chamber encircled at its top by a narrow radial channel, and the chamber is lightly pressurized from a source of gas, uncontaminated by coating material, to produce a steady flow of clean gas outwardly through said channel into balance at the edge of the wafer with a particle containing gas flow from the front surface to thereby exclude unwanted distributions of coating material or solvent to the wafer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile