The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 1998

Filed:

Oct. 13, 1995
Applicant:
Inventors:

Sam F Clarke, Orangeburg, SC (US);

Venkataraman Ramachandran, Baton Rouge, LA (US);

J Steve Staton, Orangeburg, SC (US);

Paul L Wiggins, Baton Rouge, LA (US);

Assignee:

Albemarle Corporation, Richmond, VA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ; C07C / ;
U.S. Cl.
CPC ...
203 75 ; 203 77 ; 203 80 ; 203D / ; 203D / ; 568750 ; 568756 ;
Abstract

Impure 2,6-diisopropylphenol (DIP) is purified by use of a distillation process in which a single distillation column is used. The process comprises: (a) subjecting the impure DIP to a first continuous distillation in the column in an inert environment to distill off lower boiling components and produce first column bottoms enriched in DIP; (b) collecting, cooling and storing the first column bottoms while continuously maintaining them in an inert environment; (c) discontinuing the first continuous distillation; (d) subjecting the first column bottoms to a second continuous distillation in an inert environment in the same column to produce a second overhead distillate composed of purified DIP. The process avoids the formation in the distilling mixtures of dose boiling impurities due to seepage of air through standard pipe flanges and fittings and consequent oxidation reactions which occur under the conditions needed for batch distillations conducted in typical industrial distillation facilities. These impurities include 2,6-diisopropylbenzoquinone, 2-isopropyl-6-isopropenylphenol, 2,6-diisopropenylphenol and 2,2-dimethyl-4-isopropyl-1,3-benzodioxole. The capital investment needed for a conventional continuous distillation facility is also avoided.


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