The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 1997
Filed:
Jun. 05, 1996
John V Jensen, Fremont, CA (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
A system for lithographic rastering of an image, defined by an array of pixels, onto an image-accepting substrate that allows irradiation of the total pixel pattern in reduced time. The total image is first divided into a collection of one or more geometrically isolated pixel arrays, with all pixels in an array being connected to each other. Each pixel array is decomposed into a fine region, consisting of all image pixels within P pixels of a boundary of that array, where P is a selected positive integer, such as 1, 2 or 3, and a bulk region consisting of all image pixels in that array that are not part of a fine region. A pixel array may include one or more bulk regions and one or more fine regions. A fine region for a pixel array is further decomposed into a first fine sub-region with pixel width at least equal to P1 pixels, where P1 is a selected integer satisfying 2.ltoreq.P1.ltoreq.P, and a second fine sub-region with pixel width no greater than P1-1 pixels.