The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 1997
Filed:
Mar. 29, 1996
Masayuki Fujita, Ichihara, JP;
Takahiro Ishii, Sodegaura, JP;
Sumitomo Chemical Company, Limited, Osaka, JP;
Abstract
A process for producing a styrenic polymer having a wide-spread molecular weight distribution, which comprises polymerizing a styrenic monomer or a styrenic monomer and a monomer copolymerizable with the styrenic monomer in the presence of 50 to 5000 ppm by weight of at least one compound selected from compounds having a dithiocarbamate group and sulfide compounds having at least one of an aryl group, an arylalkyl group and a thiazole group based on the total monomer to a final conversion of 40% by weight or more in the absence or presence of a radical initiator subjecting to a suspension polymerization, a batchwise bulk polymerization or a continuous bulk polymerization using a plug flow type polymerization reactor. According to the present invention, there can be provided a simplified process for preparing a styrenic polymer having a wide-spread molecular weight distribution.