The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 1997

Filed:

Aug. 09, 1994
Applicant:
Inventors:

William U Liu, Plano, TX (US);

Darrell G Hill, Plano, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437 31 ; 437126 ; 437133 ; 148D / ; 148D / ;
Abstract

The invention described herein includes, in one of its forms, a method for fabricating a semiconductor device having ledge material (148, 150, 152, 162) extending over an undercut region. The method comprises the step of forming a layer of material 164 in tensile stress over the undercut region, or region to be undercut. The layer of material in tensile stress can be a dielectric, such as silicon nitride, and provides support for the ledge material in subsequent processing steps.


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